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Follow on Google News | Wafer Inspection Equipment Market Business Segmentation by Revenue, Present ScenarioBy: Wafer Inspection Equipment Advanced wireless networking technologies such as 3G, 4G, Bluetooth, ZigBee, and wireless LAN have enabled fast and easy data transmission. Smartphones, tablets, wearables and sensors integrating these technologies have witnessed significant demand increase over the past few years. In conjunction with the demands for high level integration and development of new designs to provide support to multiple application on single platforms, intensive industry competition has led to increased demands for better quality and least defects in the semiconductor devices. Optical and E-beam are complementary technologies that perform distinct operations in the workflow. optical has fast throughputs and finds great applications in the end use. On the other hand E-beam helps in detection of smallest defects, however the throughputs are low. Owing to these features, it finds substantial applications in R&D activities. Increasing demands for advanced computing and processing has led to development of 3D finFETs, NAND and advanced DRAMs, which requires the tools to assess complex structures. Wafer assessment on the scales below 10 nm is extremely difficult, and in case of overlooking of the smallest error can impact the end use. This is expected to be major industry growth challenge over the next coming years. Asia Pacific is the largest hub for the electronic semiconductor manufacturing activities, driven by the extensive production demands specifically in the countries that include China, Taiwan, Japan and South Korea. Moreover, the region is also attributed with the presence of key electronic industry participants such as Samsung, Sony, Toshiba, Panasonic, among many others, which will help the region sustain its dominance over the next few years. Read more about study @ https://www.coherentmarketinsights.com/ Key players in the wafer inspection equipment market include Applied Materials, Zeiss Global, Hermes Microvision (ASML), FEI (Thermo Fisher Scientific), KLA-Tencor, Hitachi High-Technologies, JEOL, Lasec Corporation, Lam Research, Nikon, Nanometrics, Planar Corporation, Tokyo Seimitsu, Rudolph Technologies, and Toray Engineering. End
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