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Follow on Google News | k-Space Announces New Film Thickness and Absolute Reflectance Features for kSA MOS UltraSkSA MOS UltraScan is designed to allow fabs and research facilities to measure samples such as wafers, optical mirrors, coated panels, lenses, glass, and other polished surfaces, giving them critical information to improve their products and reduce development time. The addition of 660nm absolute reflectance is now a standard feature that is available on all new systems and on already purchased systems via a software upgrade. Measurement of film thickness and spectral reflectance are new optional features, which include additional hardware and software. The ability to measure film thickness is ideal for semi-transparent films deposited on substrates with a different index of refraction. This tool is also ideal for repeat measurements where measurement of the additional film thickness deposited is required, in addition to the total film thickness. “The addition of these features addresses the needs expressed by our customers. We have UltraScan users who want more insight into the material quality of their films at various positions on the wafer, in addition to the stress in these films. Moreover, by adding spectral reflectance and film thickness, something we borrowed from our kSA BandiT technology, the user can quickly determine the point-by-point film thickness for use in determining point-by point film stress as measured by UltraScan,” commented Darryl Barlett, CEO of k-Space Associates, Inc. kSA MOS UltraScan has also been adapted to large XY scanners for measurements on flat panels, and for samples up to 1.5m in diameter for customers requiring high precision absolute curvature measurements. For more information about kSA MOS UltraScan, visit www.k-Space.com. End
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